发明名称 Apparatus For Improving Temperature Uniformity Of A Workpiece
摘要 An apparatus for improving the temperature uniformity of a workpiece during processing is disclosed. The apparatus includes a platen having a separately controlled edge heater capable to independently heating the outer edge of the platen. In this way, additional heat may be supplied near the outer edge of the platen, helping to maintain a constant temperature across the entirety of the platen. This edge heater may be disposed on an outer surface of the platen, or may, in certain embodiments, be embedded in the platen. In certain embodiments, the edge heater and the primary heating element are disposed in two different planes, where the edge heater is disposed closer to the top surface of the platen than the primary heating element.
申请公布号 US2016268150(A1) 申请公布日期 2016.09.15
申请号 US201514657193 申请日期 2015.03.13
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Sun Dawei;Lischer D. Jeffrey;Anella Steven M.;Stone Dale K.;Stone Lyudmila
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项 1. A workpiece holding and heating apparatus, comprising: a platen, wherein the platen comprises a top surface, a bottom surface, and a sidewall extending between the top surface and the bottom surface; a primary heating element disposed in a first plane; and an edge heater disposed in a second plane, where the second plane is closer to the top surface than the first plane.
地址 Gloucester MA US