发明名称 |
METHODS FOR MODIFYING AN INTEGRATED CIRCUIT LAYOUT DESIGN |
摘要 |
A method for modifying an integrated circuit layout design includes providing an initial multiple-patterned circuit layout design comprising a first pattern exposure and a second pattern exposure; modifying the initial multiple-patterned circuit layout design by providing a subresolution assist feature to the first pattern exposure; determining whether the presence of any overlapping areas between the subresolution assist feature of the first pattern exposure and the second pattern exposure; and further modifying the initial multiple-patterned circuit layout design by: maintaining the size of any portion of the subresolution assist feature in the overlapping areas; and shrinking the size of any portion of the subresolution assist feature that is not in the overlapping areas. |
申请公布号 |
US2016314234(A1) |
申请公布日期 |
2016.10.27 |
申请号 |
US201615078032 |
申请日期 |
2016.03.23 |
申请人 |
GLOBALFOUNDRIES, Inc. |
发明人 |
Hamouda Ayman |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for modifying an integrated circuit layout design, the method comprising:
providing an initial multiple-patterned circuit layout design comprising a first pattern exposure and a second pattern exposure; modifying the initial multiple-patterned circuit layout design by providing a subresolution assist feature to the first pattern exposure; determining whether the presence of any overlapping areas between the subresolution assist feature of the first pattern exposure and the second pattern exposure; and further modifying the initial multiple-patterned circuit layout design by:
maintaining the size of any portion of the subresolution assist feature in the overlapping areas; andshrinking the size of any portion of the subresolution assist feature that is not in the overlapping areas. |
地址 |
Grand Cayman KY |