| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for removing polymer from the backside of a workpiece. SOLUTION: In this process, a workpiece is supported at its backside with the annular peripheral portion of the backside exposed in a vacuum chamber, and gas flow is confined to the outer edge of the workpiece wchich forms a gap of about 1% of the diameter of the chamber, so that a boundary between an upper process zone containing the frontside of the workpiece and a lower process zone containing the backside is provided. A first plasma is generated in a lower external chamber from a polymer etch precursor gas, and an etchant by-product is introduced from the first plasma into the lower process zone. A second plasma is generated in an upper external plasma chamber from a precursor gas of a scavenger of the etchant by-product, and scavenger species are introduced from the second plasma into the upper process zone. COPYRIGHT: (C)2008,JPO&INPIT |
