SUBSTRATE PROCESSING DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

A substrate processing device comprises a processing chamber for processing a substrate being held by a substrate holder, and a transfer machine for transferring the substrate to the substrate holder, wherein the transfer machine is provided with: a base; a first movement unit installed on the base and connected to a first mechanism unit installed outside a housing of the base; and a second movement unit installed above the first movement unit and connected to a second mechanism unit installed in a housing of the first movement unit, the transfer machine being configured in such a way that the installed position of the first mechanism unit and the installed position of the second mechanism unit at least partially overlap one another in a vertical direction.