| 摘要 |
While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved. |
| 主权项 |
1. An exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the apparatus comprising:
a frame member that supports the projection optical system; a stage system that includes a stage and a drive system, and is capable of moving the substrate in a directions of six degrees of freedom, the stage being disposed below the projection optical system and having a holder to hold the substrate, the drive system having a motor to drive the stage, the directions of six degrees of freedom including a first direction, a second direction and a third direction, the first and the second directions being orthogonal to each other within a predetermined plane orthogonal to an optical axis of the projection optical system, and the third direction being orthogonal to the predetermined plane; a detection system that is provided at the frame member, away from the projection optical system, and is capable of detecting a mark of the substrate with each of a plurality of detection areas whose positions are different from each other in the first direction; a measurement system that has a plurality of sensors, and measures positional information of the stage in the directions of six degrees of freedom, the plurality of sensors each irradiating a grating member with a measurement beam, and the grating member having a reflection-type grating that is periodic in a direction parallel to the predetermined plane; and a controller that is coupled to the stage system, and controls the drive system based on measurement information of the measurement system, wherein the positional information of the stage is measured with the measurement system, in each of a detection operation of detecting the mark with the detection system and an exposure operation of the substrate, and the controller controls the drive system so that the substrate is moved relative to the plurality of detection areas in the second direction in order to detect a plurality of marks of the substrate with at least a part of the plurality of detection areas in the detection operation, and also controls the drive system so that alignment of the substrate is performed based on detection information of the detection system in the exposure operation, positions of the plurality of marks being different from each other in the second direction. |
