| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive digital exposure device having high throughput. <P>SOLUTION: When a first substrate material 200 is exposed on the surface by a laser exposure device 100, the substrate material is conveyed through a second standby stage 312 to a reversal machine 300. During the above step, a second substrate material 200 stands by on a first standby stage 310. While the first substrate material 200 is reversed upside down in the reversing machine 300, the second substrate material 200 is exposed on the surface by the laser exposure device 100. Since the laser exposure device 100 is a digital exposure device, it can read alignment values, such as positions, dimensions and distortion in the forward path (upward) and perform the scanning exposure in the backward path (downward). Thus, the second substrate material 200 can be exposed on one surface, while reversing the first substrate material 200, thereby increasing the process speed of the entire exposure device system. <P>COPYRIGHT: (C)2007,JPO&INPIT |
