发明名称 BRUSHLESS ROTARY PLASMA ELECTRODE STRUCTURE AND FILM COATING SYSTEM
摘要 A brushless rotary plasma electrode structure is disclosed. The brushless rotary plasma electrode structure includes a main body, a plurality of guided portions, and a plurality of conducting-through members. The main body further includes a plurality of electrode portions that have a first salient portion furnished at the periphery thereof. The guided portion is penetrated through the electrode portion. Each of the conducting-through members further includes a second salient portion. There is an internal in both the first salient portion and the second salient portion. In addition, a film coating system is also provided.
申请公布号 US2016208403(A1) 申请公布日期 2016.07.21
申请号 US201514842316 申请日期 2015.09.01
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 LIN Shih-Chin;CHANG Chia-Hao;LIN Kuang-Yu
分类号 C25D17/10 主分类号 C25D17/10
代理机构 代理人
主权项 1. A brushless rotary plasma electrode structure, comprising: A main body being rotating with respect to an axis further comprising a plurality of electrode portions that are disposed at intervals, and the electrode portions have a first salient portion furnished at the periphery thereof; A plurality of guided portions penetrating through those electrode portions; and A plurality of conducting-through members, each of them further comprising a second salient portion having a first interval between thereof and its corresponding the first salient portion.
地址 Hsin-Chu TW
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