SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

A semiconductor manufacturing apparatus according to an embodiment includes a reaction chamber that is capable of housing a semiconductor substrate and is capable of forming a deposited film on a surface of the semiconductor substrate. A first container stores a source of the deposited film. A second container stores a source gas generated in the first container, and supplies the source gas to the reaction chamber. A first pipe connects the first container and the second container. A second pipe supplies an inert gas to the second container.

主权项

1. A semiconductor manufacturing apparatus comprising:
a reaction chamber being capable of housing a semiconductor substrate and being capable of forming a deposited film on a surface of the semiconductor substrate; a first container storing a source of the deposited film; a second container storing a source gas generated in the first container and supplying the source gas to the reaction chamber; a first pipe connecting the first container and the second container; and a second pipe supplying an inert gas to the second container.