| 主权项 |
1. An exposure method of exposing a substrate with an illumination light via a projection optical system, the method comprising:
moving a stage that holds the substrate, on abase disposed below the projection optical system; in an encoder system in which one of a grating section and a head is provided at the stage and the other of the grating section and the head is provided at a frame member, measuring positional information of the stage with a plurality of the heads that face the grating section, the frame member supporting the projection optical system; and controlling movement of the stage based on the positional information measured with the encoder system, while compensating for a measurement error of the encoder system that occurs due to the head, wherein during movement of the stage, one head of the plurality of heads is switched to another head different from the plurality of heads, after the switching, the positional information of the stage is measured with a plurality of heads that include remaining heads and the another head, the remaining heads excluding the one head of the plurality of heads used before the switching, and correction information for controlling movement of the stage using the another head after the switching is acquired based on the positional information measured with the plurality of heads used before the switching. |
