<p>A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.</p>
申请公布号
WO2007048433(A1)
申请公布日期
2007.05.03
申请号
WO2005EP11593
申请日期
2005.10.28
申请人
CARL ZEISS SMS GMBH;PLATZGUMMER, ELMAR;KNIPPELMEYER, RAINER