发明名称 |
FLIPPING STAGE ARRANGEMENT FOR REDUCED WAFER CONTAMINATION CROSS SECTION AND IMPROVED MEASUREMENT ACCURACY AND THROUGHPUT |
摘要 |
A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.
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申请公布号 |
US2009009763(A1) |
申请公布日期 |
2009.01.08 |
申请号 |
US20070772838 |
申请日期 |
2007.07.03 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ZANGOOIE SHAHIN;ZHOU LIN;YOUNG ROGER M.;BOTTINI CLEMENTE;FOSTER ROBERT J.;FIEGE RONALD D. |
分类号 |
G01J3/45;G01B11/14;G01B11/30 |
主分类号 |
G01J3/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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