| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having a good profile and excellent stripping property can be produced.SOLUTION: The resist composition comprises a resin having an acid-labile group, an acid generator, a compound having two or more phenolic hydroxyl groups (other than a resin), and a solvent. The resin having an acid-labile group is, for example, a resin containing a structural unit represented by formula (a1-2). In the formula Rand Reach independently represent a hydrogen atom or a hydrocarbon group; Rrepresents a hydrocarbon group; or Rrepresents a hydrogen atom or a hydrocarbon group and Rand Rare bonded to each other to represent a divalent hydrocarbon group, in which a methylene group included in these hydrocarbon groups may be replaced by an oxygen atom or a sulfur atom; Rrepresents a hydrogen atom or a methyl group; Rrepresents an alkyl group or an alkoxy group; and mx represents an integer of 0 to 4.SELECTED DRAWING: None |
