| 摘要 |
<p>An exposure apparatus is provided with a stage (5) for placing and transferring a color filter substrate (1); a mask stage (6) for holding a photomask (14) by having the photomask close to and face the color filter substrate (1); a light source (7) constantly lighted during exposure for irradiating the photomask (14) with exposure light; a photo-integrator (8) for making luminance distribution of the exposure light to be applied to the photomask (14) uniform; a condenser lens (9) for making the exposure light to be applied to the photomask (14) parallel light; an imaging lens (10) for forming an end plane image of the photo-integrator (8) on a front side of the condenser lens (9); and a shutter (11), which is arranged close to an imaging position of the imaging lens (10) to switch to irradiate or block the exposure light, in synchronization with successive passing of a plurality of exposure regions (2) under the photomask (14) by movement of the color filter substrate (1). Thus, a section, which is between the exposure regions adjacent to each other, at the external of the exposure regions set along a transfer direction of a body to be exposed, is prevented from being exposed to the body to be exposed.</p> |
