发明名称 GAS SUPPLY PIPE FOR PLASMA TREATMENT
摘要 <p>Peeling off of a deposited film formed on the outer surface of a gas supply pipe is effectively prevented, and adhesion of a deposited film which has been peeled off to the inner surface of a container or to a nozzle-sealed surface can be prevented as much as possible. A gas supply pipe 4 for plasma treatment which is inserted in a container 3 held in a plasma treatment chamber 1 to form a deposited film on the inner surface of the container 3 by the supply of a gas for plasma treatment to the inside of the container 3, wherein a supply pipe main body 5 constituting the entire gas supply pipe 4 is formed of a material having a thermal expansion coefficient of 10 × 10 -6 /°C or less. As a result, the possibility that a deposited film formed on the outer surface of the gas supply pipe 4 is peeled off by thermal expansion or thermal shrinkage of the gas supply pipe 4 is reduced.</p>
申请公布号 EP2019153(A1) 申请公布日期 2009.01.28
申请号 EP20070742791 申请日期 2007.05.02
申请人 TOYO SEIKAN KAISHA, LTD. 发明人 KOISHI, RYOUSUKE;FUJIMOTO, HIROSHI
分类号 C23C16/455 主分类号 C23C16/455
代理机构 代理人
主权项
地址