Etching technique for microfabrication substrates

摘要

A method for creating small features in an Al/Ag/Ti multilayer stack is disclosed. The method uses a combination of wet and dry etching techniques to anisotropically etch the layers.

主权项

1. An etching method for an alumina/silver/titanium multilayer stack, comprising:
applying a buffered oxide etch to etch through alumina; applying an oxygen plasma to the exposed silver to form silver oxide; and etching the silver oxide with ammonia.