发明名称 |
CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING |
摘要 |
Embodiments of the disclosure relate to deposition of a conformal organic material over a feature formed in a photoresist or a hardmask, to decrease the critical dimensions and line edge roughness. In various embodiments, an ultra-conformal carbon-based material is deposited over features formed in a high-resolution photoresist. The conformal organic layer formed over the photoresist thus reduces both the critical dimensions and the line edge roughness of the features. |
申请公布号 |
WO2016200498(A1) |
申请公布日期 |
2016.12.15 |
申请号 |
WO2016US29746 |
申请日期 |
2016.04.28 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MEBARKI, Bencherki;MANNA, Pramit;MIAO, Li Yan;PADHI, Deenesh;KIM, Bok Hoen;BENCHER, Christopher Dennis |
分类号 |
H01L21/027;H01L21/3065 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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