发明名称 APPARATUS AND METHOD OF TRANSPORTING SUBSTRATE, AND SEMICONDUCTOR FABRICATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology which can aim at the reduction of air-conditioning kinetic energy in the case of conveying while keeping the atmosphere of the ambients of a substrate pure. SOLUTION: A conveyance course is constituted along the arrangement position of a plurality of processors 10 which perform a predetermined treatment to the substrate W, and a conveyor 30 which delivers the substrate W and carries out intermittent conveyance in preparation position P1 corresponding to respective processors 10. On the conveyor 30, a substrate storing container 50 which contains the substrate W is airtightly freely attachably and detachably mounted, and in the state that the substrate W is contained to the substrate storing container 50, it conveys in the receiving and delivering preparation position P2. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006228808(A) 申请公布日期 2006.08.31
申请号 JP20050037774 申请日期 2005.02.15
申请人 SEIKO EPSON CORP 发明人 NAKADA HIDEO;NAKAJIMA TOSHIKI
分类号 H01L21/677;B65G49/00;B65G49/07 主分类号 H01L21/677
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