Systems, Devices, and/or Methods for Deposition of Metallic and Ceramic Coatings

摘要

Certain exemplary embodiments can provide a system, which can comprise depositing a filament and a vapor flux that emanates from one or more vapor sources. The vapor flux is directed toward the filament via a carrier gas in a coating chamber under vacuum. The carrier gas can substantially surround the vapor flux as the filament is exposed to a coating material comprised by the vapor flux. Wherein the filament moves relative to the vapor flux.

主权项

1. A system comprising:
a filament; a vapor flux that emanates from one or more vapor sources, said vapor flux directed toward said filament via a carrier gas in a coating chamber under vacuum, said carrier gas substantially surrounding said vapor flux as said filament is exposed to a coating material comprised by said vapor flux, wherein said filament moves relative to said vapor flux.