发明名称 |
METHOD FOR PRODUCING LONG POLISHING PAD |
摘要 |
<p>Disclosed is a method for producing a long polishing pad, which is capable of preventing slurry leakage and excellent in optical detection accuracy, with high productivity. Specifically disclosed is a method for producing a long polishing pad, which comprises a step for forming a long polishing unit (9) made of a polyurethane foam, a step for forming an opening, which is composed of a through hole (12) and a shelf portion (13), in the long polishing unit (9), a step for forming a convex-shaped long light-transmitting unit (10) which is thinner than the long polishing unit (9), a step for arranging the long light-transmitting unit (10) in the opening of the long polishing unit, and a step for bonding a transparent supporting film (11) on the rear surface of the long polishing unit.</p> |
申请公布号 |
WO2008047631(A1) |
申请公布日期 |
2008.04.24 |
申请号 |
WO2007JP69685 |
申请日期 |
2007.10.09 |
申请人 |
TOYO TIRE & RUBBER CO., LTD.;NAKAI, YOSHIYUKI;KIMURA, TSUYOSHI;SHIMOMURA, TETSUO;FUKUDA, TAKESHI;OGAWA, KAZUYUKI |
发明人 |
NAKAI, YOSHIYUKI;KIMURA, TSUYOSHI;SHIMOMURA, TETSUO;FUKUDA, TAKESHI;OGAWA, KAZUYUKI |
分类号 |
B24B37/20;B29C39/02;B29C39/10;B29C65/48;B29K75/00;H01L21/304 |
主分类号 |
B24B37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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