发明名称 METHOD FOR PRODUCING LONG POLISHING PAD
摘要 <p>Disclosed is a method for producing a long polishing pad, which is capable of preventing slurry leakage and excellent in optical detection accuracy, with high productivity. Specifically disclosed is a method for producing a long polishing pad, which comprises a step for forming a long polishing unit (9) made of a polyurethane foam, a step for forming an opening, which is composed of a through hole (12) and a shelf portion (13), in the long polishing unit (9), a step for forming a convex-shaped long light-transmitting unit (10) which is thinner than the long polishing unit (9), a step for arranging the long light-transmitting unit (10) in the opening of the long polishing unit, and a step for bonding a transparent supporting film (11) on the rear surface of the long polishing unit.</p>
申请公布号 WO2008047631(A1) 申请公布日期 2008.04.24
申请号 WO2007JP69685 申请日期 2007.10.09
申请人 TOYO TIRE & RUBBER CO., LTD.;NAKAI, YOSHIYUKI;KIMURA, TSUYOSHI;SHIMOMURA, TETSUO;FUKUDA, TAKESHI;OGAWA, KAZUYUKI 发明人 NAKAI, YOSHIYUKI;KIMURA, TSUYOSHI;SHIMOMURA, TETSUO;FUKUDA, TAKESHI;OGAWA, KAZUYUKI
分类号 B24B37/20;B29C39/02;B29C39/10;B29C65/48;B29K75/00;H01L21/304 主分类号 B24B37/20
代理机构 代理人
主权项
地址