| 发明名称 |
ORGANOSILICA MATERIALS AND USES THEREOF |
| 摘要 |
Provided herein are organosilica materials, which is a polymer of at least one monomer of Formula [Z1OZ2OSiCH2]3 (I), wherein each Z1 and Z2 independently represent a hydrogen atom, a C1-C4 alkyl group or a bond to a silicon atom of another monomer. Processes of using the organosilica materials, e.g., for gas separation, are also provided herein. |
| 申请公布号 |
US2016168173(A1) |
申请公布日期 |
2016.06.16 |
| 申请号 |
US201514965992 |
申请日期 |
2015.12.11 |
| 申请人 |
Li Quanchang;Calabro David Charles;Podsiadlo Paul;Beeckman Jean Willem Lodewijk;Mao Kanmi |
发明人 |
Li Quanchang;Calabro David Charles;Podsiadlo Paul;Beeckman Jean Willem Lodewijk;Mao Kanmi |
| 分类号 |
C07F7/08;B01J20/28;B01J20/22;B01J31/02;B01J35/10 |
主分类号 |
C07F7/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An organosilica material, which is a polymer of at least one monomer of Formula [Z1OZ2OSiCH2]3 (I), wherein each Z1 and Z2 independently represent a hydrogen atom, a C1-C4 alkyl group or a bond to a silicon atom of another monomer, wherein the organosilica material exhibits an XRD pattern with only one peak, said peak being between about 1 and about 2 degrees 2θ, and wherein the organosilica material has an average pore diameter between about 2.5 nm and about 4 nm. |
| 地址 |
Dayton NJ US |
