发明名称 |
Integrated Circuit Assembly and Method of Making |
摘要 |
An integrated circuit assembly includes an insulating layer having a having a first surface and a second surface. A first active layer contacts the first surface of the insulating layer. A metal bond pad is electrically connected to the first active layer and formed on the second surface of the insulating layer. A substrate having a first surface and a second surface, with a second active layer formed in the first surface, is provided such that the first active layer is coupled to the second surface of the substrate. |
申请公布号 |
US2016284671(A1) |
申请公布日期 |
2016.09.29 |
申请号 |
US201615173251 |
申请日期 |
2016.06.03 |
申请人 |
QUALCOMM SWITCH CORP. |
发明人 |
Stuber Michael A.;Molin Stuart B.;Drucker Mark;Fowler Peter |
分类号 |
H01L25/065;H01L27/12;H01L23/00 |
主分类号 |
H01L25/065 |
代理机构 |
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代理人 |
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主权项 |
1. An integrated circuit assembly comprising:
an insulating layer having a first surface and a second surface; a first active layer contacting the first surface of the insulating layer; a metal bond pad formed on the second surface of the insulating layer; wherein the metal bond pad is electrically coupled to the first active layer; a substrate having a first surface and a second surface, the first active layer being coupled to the second surface of the substrate; a second active layer formed on the first surface of the substrate; a first singulated wafer portion including the insulating layer and the first active layer; and a second singulated wafer portion bonded to the first singulated wafer portion, the second wafer singulated portion including the substrate and the second active layer. |
地址 |
San Diego CA US |