发明名称 感光性接着剤組成物、フィルム状接着剤、接着シート、接着剤パターン、接着剤層付半導体ウェハ、半導体装置、及び半導体装置の製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive adhesive composition having a pattern forming property and having an excellent low-temperature thermo-compression bonding property, a high-temperature adhesive property (heat resistance) and moisture resistance reliability after pattern formation and also having an excellent low-temperature adhering property when formed in a film, to provide a film-like adhesive, an adhesive sheet, an adhesive pattern, semiconductor wafer provided with the adhesive, a semiconductor device and a method for manufacturing the semiconductor device using the composition. <P>SOLUTION: The photosensitive adhesive composition contains (A) an alkali-soluble resin, (B) a radiation polymerizable compound, (C) a photoinitiator, (D) a heat radical generator whose 1-minute half-life temperature is &ge;120&deg;C and (E) a thermosetting resin. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP6045772(B2) 申请公布日期 2016.12.14
申请号 JP20090095695 申请日期 2009.04.10
申请人 日立化成株式会社 发明人 満倉 一行;川守 崇司;増子 崇;加藤木 茂樹
分类号 C09J201/00;C09J4/00;C09J7/00;C09J7/02;C09J11/06;C09J163/00;G03F7/004;G03F7/032;H01L21/301;H01L21/52;H01L25/065;H01L25/07;H01L25/18 主分类号 C09J201/00
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