发明名称 APPLICATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a means which keeps the discharge function of an application nozzle always at normal conditions and improves an equipment utilization or a production efficiency. <P>SOLUTION: An ultrasonic cleansing portion 140 and a solvent atmosphere chamber 142 are arranged side by side near an application processing portion. When a nozzle portion 120a of a resist nozzle 120 is inserted into an opening 188a of a cover 188 in a washing tub 164, a lower end portion (a section near an outlet) of the nozzle portion 120a inside the washing tub 164 is soaked in a thinner bath charged with ultrasonic waves from an ultrasonic-transducing box body 166. In the solvent atmosphere chamber 142, thinner S overflowing through a notch 170a provided on an upper end portion of a partition 170 from the washing tub 164 of the ultrasonic cleansing portion 140 is introduced into a solvent reservoir 192, and when the solvent reservoir 192 comes filled up, overflows and falls down to a drain groove 196. The drain groove 196 is washed. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005205329(A) 申请公布日期 2005.08.04
申请号 JP20040015355 申请日期 2004.01.23
申请人 TOKYO ELECTRON LTD 发明人 KAWAGUCHI YOSHIHIRO
分类号 G03F7/16;B05C11/08;B05C11/10;H01L21/027 主分类号 G03F7/16
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