发明名称 |
Multilayer mirror, method for manufacturing the same, and exposure equipment |
摘要 |
A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full- width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
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申请公布号 |
US2008049307(A1) |
申请公布日期 |
2008.02.28 |
申请号 |
US20070907798 |
申请日期 |
2007.10.17 |
申请人 |
NIKON CORPORATION |
发明人 |
KANDAKA NARIAKI;MURAKAMI KATSUHIKO;KOMIYA TAKAHARU;SHIRAISHI MASAYUKI |
分类号 |
G02B5/09;G02B5/08;G02B5/26;G02B5/28;G03F7/20;G21K1/06;H01L21/027 |
主分类号 |
G02B5/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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