发明名称 |
Film Deposition Method And Film Deposition System |
摘要 |
There is provided a film deposition method of depositing a multielement metal oxide film capable of depositing a multielement metal oxide film having a desired composition and a desired thickness in an improved repeatability. A film deposition method deposits a multielement metal oxide film on a surface of a workpiece by a film depositing process including supplying organometallic source gases generated by atomizing a plurality of organometallic compounds into a processing vessel capable of being evacuated. A dummy film deposition process corresponding to at least three cycles of the film deposition process is carried out by placing a dummy workpiece in the processing vessel and supplying the organometallic source gases into the processing vessel immediately before starting the film deposition process for depositing a multielement metal oxide film on the workpiece. Thus a multielement metal oxide film having a desired composition and a desired thickness can be deposited in an improved repeatability.
|
申请公布号 |
US2008171142(A1) |
申请公布日期 |
2008.07.17 |
申请号 |
US20060883075 |
申请日期 |
2006.01.11 |
申请人 |
MATSUMOTO KENJI;SAKODA TOMOYUKI;NASU MASAYUKI;IKEDA GAKU |
发明人 |
MATSUMOTO KENJI;SAKODA TOMOYUKI;NASU MASAYUKI;IKEDA GAKU |
分类号 |
B05D5/12;C23C16/02 |
主分类号 |
B05D5/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|