| 摘要 |
PROBLEM TO BE SOLVED: To provide equipment that can prevent the inner surface of a lifter's retention groove and the lower limit edge of a substrate from rubbing each other, the lifter going up and down between inside a processing tank and above it while holding multiple substrates, to generate dust and contaminants, thus contaminating the substrate or adding unneeded force to the substrate and damaging it when substrate transferring is done between the lifter and a substrate transport mechanism traveling horizontally while holding multiple substrates. SOLUTION: In substrate treating equipment, the groove bottom's width of a lower support groove 34a formed on substrate support units 32 on a pair of chucks 28 of a substrate transfer robot is to be of a first size that is the thickness of a substrate W plus an amount of the substrate support units 32's anticipated displacement in a long direction with respect to substrate holders 18a, 18b and 18c of the lifter 12, while on the other hand, the groove bottom's width of an upper support groove 34b formed on the substrate support units 32 is to be of a second size smaller than the first size so that mutually adjacent substrates supported by the substrate support units 32 may not be brought into contact with each other. COPYRIGHT: (C)2008,JPO&INPIT
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