主权项 |
1. A capacitor structure comprising:
a substrate; and at least one device formed on said substrate, said device including a first section and a second section, said first section including:
a first plurality of source/drain regions formed in said substrate, anda first plurality of gates formed above said substrate such that each of said first plurality of gates is formed between each pair of source/drain regions of said first plurality of source/drain regions to form a first section channel between said each pair of source/drain regions, said second section including:
a second plurality of source/drain regions formed in said substrate, anda second plurality of gates formed above said substrate such that each of said second plurality of gates is formed between each pair of source/drain regions of said second plurality of source/drain regions to form a second section channel between said each pair of source/drain regions, wherein said first plurality of gates are coupled with said second plurality of gates. |