发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 Provided are an exposure device and an exposure method which allow high efficiency and extended lifespan of a spatial light modulator to be achieved. An exposure device (100) is provided with: a microlens array (142) where an array of microlenses for collecting light from a light source are disposed; a spatial light modulation element (digital micromirror device) (12) where pixels for modulating the light collected by the microlens array (142) are disposed; a first focusing optical system (143) for focusing the light collected by the microlens array (142) onto the spatial light modulation element (12); and a second focusing optical system (16) for focusing the light modulated by the spatial light modulation element (12) onto a photosensitive material.
申请公布号 WO2016157697(A1) 申请公布日期 2016.10.06
申请号 WO2016JP00908 申请日期 2016.02.19
申请人 USHIO DENKI KABUSHIKI KAISHA 发明人 OTSUKA, Akira
分类号 G03F7/20;G02B3/00;G02B19/00;G02B26/02 主分类号 G03F7/20
代理机构 代理人
主权项
地址