发明名称 Lithographic apparatus, a device manufacturing method and a device manufactured thereby
摘要 A method of forming images on a lithographic substrate is disclosed, the method including grouping a plurality of image regions together to form a combined image, determining or receiving a location at which the combined image is to be positioned on the substrate, calculating locations at which the image regions forming the combined image are to be positioned on the substrate, and using a lithographic apparatus to project the image regions at the calculated locations onto the substrate.
申请公布号 US2008050040(A1) 申请公布日期 2008.02.28
申请号 US20060509073 申请日期 2006.08.24
申请人 ASML NETHERLANDS B.V. 发明人 GEERS MELLE CORNELIS;VAN DEN BRINK ENNO;GEELINK ERIC MARIA
分类号 G06K9/00;G06K9/36 主分类号 G06K9/00
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