| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition film formation device and method that form a deposition film of good quality having superior uniformity of film characteristics and a reduced deposition film defect, and has simple constitution and superior maintainability.SOLUTION: A reaction vessel 101 includes a first rod-like body 123 which can move or extend in a substrate holder 107 in a longitudinal direction of the substrate holder. The substrate holder internally has a second rod-like body 133 with conductivity, which is electrically connected to the substrate holder, and the second rod-like body 133 is pushed out as the first rod-like body provided to the reaction vessel moves or extends in the longitudinal direction so as to come into contact with the reaction vessel, so that the substrate holder is electrically connected to the reaction vessel via the second rod-like body. |
