发明名称 EMBROIDERY PATTERN PLACEMENT SYSTEM, EMBROIDERY PATTERN PLACEMENT DEVICE, METHOD OF PLACING EMBROIDERY PATTERN FOR EMBROIDERY PATTERN PLACEMENT DEVICE, AND SEWING MACHINE
摘要 Provided is an embroidery pattern placement system including: an image-taking unit configured to take an image with an embroidery frame and cloth to be embroidered included in an image taking range; an image analyzing unit configured to analyze to make correspondence between the information of the embroidery frame obtained by the embroidery frame information obtaining unit and the embroidery frame in the image; a display control unit configured to display the embroidery pattern obtained by the embroidery pattern obtaining unit and at least a part of the image taken by the image-taking unit in an overlapping manner at an identical scale; and an operation unit configured to accept an operation from a user; an embroidery placement editing unit configured to determine a position and orientation of the embroidery pattern relative to the embroidery frame according to a content of the operation to the operation unit.
申请公布号 US2016215423(A1) 申请公布日期 2016.07.28
申请号 US201514824020 申请日期 2015.08.11
申请人 Janome Sewing Machine Co., Ltd. 发明人 KONGO Takeshi;ISHII Kyoko
分类号 D05B19/12 主分类号 D05B19/12
代理机构 代理人
主权项 1. An embroidery pattern placement system comprising: an image-taking unit that takes an image with an embroidery frame and cloth to be embroidered attached to the embroidery frame included in an image taking range; an embroidery frame information obtaining unit that obtains information of the embroidery frame; an image analyzing unit that analyzes to make correspondence between the information of the embroidery frame obtained by the embroidery frame information obtaining unit and the embroidery frame in the image taken by the image-taking unit; an embroidery pattern obtaining unit that obtains information relating to the embroidery pattern to be embroidered; a display control unit that displays the embroidery pattern obtained by the embroidery pattern obtaining unit and at least a part of the image taken by the image-taking unit in an overlapping manner at an identical scale in a display unit, using the analysis result by the image analyzing unit; an operation unit that accepts an operation from a user; an embroidery placement editing unit that determines a position and orientation of the embroidery pattern relative to the embroidery frame according to a content of the operation to the operation unit; and an embroidery execution unit that executes embroidery to the cloth to be embroidered attached to the embroidery frame such that the embroidery corresponds to the position and the orientation of the embroidery pattern determined by the embroidery placement editing unit.
地址 Tokyo JP