发明名称 凹凸パターン形成用フィルム、そのフィルムを形成するための樹脂組成物、そのフィルムを有する成形体及びそのフィルムを有する成形体の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a film for forming a rugged pattern, which does not generate voids on the surface of the rugged pattern of a molding, has improved peelability from a molding mold, has a good rugged pattern, and which can exhibit heat resistance and to provide a resin composition for forming the film, the molding having the film, and a production method thereof.SOLUTION: Provided is a film comprising a fluorine-containing polyimide resin, which is used for forming a rugged pattern by using a molding mold, wherein a fluorine content in the film is 1-60 mass% and an imidization ratio in the film is 20% or higher.
申请公布号 JP6030918(B2) 申请公布日期 2016.11.24
申请号 JP20120235172 申请日期 2012.10.24
申请人 株式会社日本触媒 发明人 牧野 朋未;芥川 寛信
分类号 B29C59/02;C08J5/18;H01L21/027 主分类号 B29C59/02
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