发明名称 |
POLARIZING PLATE FABRICATION METHOD |
摘要 |
The polarizing plate fabrication method includes the following: (1) preparing a transfer material including a temporary support and a transfer body including an optical anisotropic layer and an optical anisotropic layer; (2) peeling the temporary support and separating it from the transfer body; and (3) adhering the transfer body to a film including a polarizer, in which both the optical anisotropic layer and the optical anisotropic layer are layers formed of a polymerizable composition including a liquid crystal compound applied onto the temporary support, and the optical anisotropic layer and the optical anisotropic layer both have in-plane retardation, and a difference between slow axis directions in the optical anisotropic layer and the optical anisotropic layer is in a range of 3° to 90°. The fabrication method allows adhering of an optical anisotropic layer having a variety of optical compensation capabilities to a variety of polarizers in a minimum constitution. |
申请公布号 |
US2016195655(A1) |
申请公布日期 |
2016.07.07 |
申请号 |
US201615069307 |
申请日期 |
2016.03.14 |
申请人 |
FUJIFILM Corporation |
发明人 |
KAGAWA Hideaki;OKI Kazuhiro |
分类号 |
G02B5/30 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
1. A polarizing plate fabrication method comprising the following (1) to (3):
(1) preparing a transfer material including a temporary support and a transfer body including an optical anisotropic layer 1 and an optical anisotropic layer 2; (2) peeling the temporary support and separating the temporary support and the transfer body; and (3) adhering the transfer body to a film including a polarizer, wherein both the optical anisotropic layer 1 and the optical anisotropic layer 2 are layers formed of a polymerizable composition including a liquid crystal compound applied onto the temporary support, and the optical anisotropic layer 1 and the optical anisotropic layer 2 both have in-plane retardation, and a difference between slow axis directions in the optical anisotropic layer 1 and the optical anisotropic layer 2 is in a range of 3° to 90°. |
地址 |
Tokyo JP |