发明名称 |
REFLECTION MEMBER AVAILABLE FOR HEAT SHIELD USE AND PROJECTOR INCLUDING REFLECTION MEMBER |
摘要 |
The present invention provides a reflection member including a selective reflection layer; and two ¼ wavelength phase difference plates, in which the selective reflection layer is disposed between the two ¼ wavelength phase difference plates, the selective reflection layer includes a layer of a fixed cholesteric liquid crystal phase having a central wavelength of selective reflection at a visible light range wavelength λi, and the selective reflection layer includes a layer in which a twisted direction of a helix of a cholesteric liquid crystal is only one of right or left as the layer of a fixed cholesteric liquid crystal phase having selective reflection at the wavelength λi. The reflection member of the present invention can be used particularly as a heat shielding member, which can reduce damage to the optical systems due to external light including visible light while efficiently extracting projected light. |
申请公布号 |
US2016357096(A1) |
申请公布日期 |
2016.12.08 |
申请号 |
US201615238818 |
申请日期 |
2016.08.17 |
申请人 |
FUJIFILM Corporation |
发明人 |
ICHIHASHI Mitsuyoshi;SAIKI Yuki;OKI Kazuhiro;TAGUCHI Takao |
分类号 |
G03B21/16;G03B21/28;G02B27/01;G02B5/20;G02B5/26 |
主分类号 |
G03B21/16 |
代理机构 |
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代理人 |
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主权项 |
1. A reflection member for shielding an optical system that projects linearly polarized light from heat, comprising:
a selective reflection layer; and two ¼ wavelength phase difference plates, wherein the selective reflection layer is disposed between the two ¼ wavelength phase difference plates, the selective reflection layer includes a layer of a fixed cholesteric liquid crystal phase, having a central wavelength of selective reflection at a wavelength λi in a wavelength range of the linearly polarized light, and the selective reflection layer includes a layer in which a twisted direction of a helix of a cholesteric liquid crystal is only one of right or left as the layer of a fixed cholesteric liquid crystal phase having a central wavelength of selective reflection at the wavelength λi. |
地址 |
Tokyo JP |