发明名称 Vapor phase growth apparatus
摘要 A vapor phase growth apparatus has a plurality of rotation susceptors to hold the semiconductor wafer, and a disk-like revolution susceptor on which the plurality of rotation susceptors are rotatably mounted through a bearing. The plurality of rotation susceptors each are, on its periphery, provided with a pinion gear that meshes with a common gear that allows each of the plurality of rotation susceptors to rotate on its center axis. The outermost end of rotation susceptor is substantially aligned with the outermost end of revolution susceptor and the pinion gear is located directly above the bearing.
申请公布号 US2006124062(A1) 申请公布日期 2006.06.15
申请号 US20050070162 申请日期 2005.03.03
申请人 HITACHI CABLE, LTD. 发明人 NAGAI HISATAKA
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
主权项
地址