发明名称 Method and apparatus for removing at least one hydrogen chalcogen compound from an exhaust gas stream
摘要 <p>A method for removing at least one hydrogen chalcogen compound being in gaseous state at standard conditions from an input exhaust gas stream is proposed comprising the steps of - guiding the input exhaust gas stream into an aqueous environment; - supplying at least one base to the aqueous environment and - extracting an output exhaust gas stream from the aqueous environment. According to the invention the amount of base supplied is controlled such that the pH-value of the environment is larger than 11. The apparatus (1) and the method according to the present invention allow the efficient removal of hydrogen chalcogen compounds from exhaust gases in particular exhaust gases of the production processes of semiconductor compounds like e. g. photovoltaic modules.</p>
申请公布号 EP2030670(A1) 申请公布日期 2009.03.04
申请号 EP20070115443 申请日期 2007.08.31
申请人 INTEGA GMBH 发明人 KRUEGER, ULRICH
分类号 B01D53/46;A62D3/30;B01D53/52;B01D53/64 主分类号 B01D53/46
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