发明名称 GERMANIUM SULFIDE COMPOUNDS FOR SOLID ELECTROLYTIC MEMORY ELEMENTS
摘要 <p>A method for making high purity GeS and related compounds at low temperatures and pressures in a Chemical Vapor Deposition (CVD) process for solid electrolyte memory elements and other applications. Disclosed is a method of generating a proper chemical and energy environment for the formation of GeS and related compounds on a specific surface. The produced films have great utility in memory and other devices. The invented technology offers great cost saving and advantage of low temperature film creation through the use of plasma assisted deposition - increasing its compatibility for use not only on silicon (or ceramic or glass) non metal substrates as well as polymer or thin metal foil substrates which would be damaged by higher temperature processes.</p>
申请公布号 WO2009051799(A1) 申请公布日期 2009.04.23
申请号 WO2008US11874 申请日期 2008.10.18
申请人 STRUCTURED MATERIALS INC.;TOMPA, GARY, S.;COLEMAN, ELANE;PROVOST, LLOYD, G. 发明人 TOMPA, GARY, S.;COLEMAN, ELANE;PROVOST, LLOYD, G.
分类号 C01F1/00;C22C28/00;H01L21/02 主分类号 C01F1/00
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