| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a circuit pattern transferring device which doesn't require any mask pattern and can faithfully transfer a pattern corresponding to a mass production, and to provide a circuit pattern transferring method. <P>SOLUTION: The circuit pattern transferring method comprises the steps of arranging respective substrates 13, 21 at a patterning side on which a circuit pattern 15 in the substrate 13 of a transferring origin is beforehand formed, while mutually approaching resist films formed, on the substrate 21 front surface of a transferring destination; irradiating from a substrate rear surface of the transferring destination a light of a wavelength which can penetrate through the substrate 21 of the transferring destination and is not exposed to the resist films; generating an approaching space light in a local region corresponding to the circuit pattern formed on a patterning side of the substrate 21 of the transferring origin, on the basis of the light which is irradiated and is penetrated through the substrate 21 of the transferring destination; and exposing the resist film adjacent to the patterning side by the generated approaching space light. <P>COPYRIGHT: (C)2007,JPO&INPIT |
