发明名称 GAS BARRIER FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film having good barrier properties against oxygen or steam. SOLUTION: The gas barrier film comprises: a base material 2; the gas barrier layer 3 formed at least on one side of the base material 2 and comprising a vapor deposition film; and a sol-gel coating layer 4 formed on the gas barrier layer 3 and comprising a film containing a hydrolysate of an organometal compound or an alkali metal polysilicate represented by the formula: M<SB>2</SB>O-nSiO<SB>2</SB>(wherein M is lithium or a plurality of alkali metals containing lithium and n is a molar ratio of 1-20) and silica particles originating from colloidal silica. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007098655(A) 申请公布日期 2007.04.19
申请号 JP20050288813 申请日期 2005.09.30
申请人 DAINIPPON PRINTING CO LTD 发明人 OTA YURIE
分类号 B32B9/00 主分类号 B32B9/00
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