EXPOSURE APPARATUS, REMOVAL METHOD, AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus that exposes onto a substrate a pattern of a mask that is located in a vacuum or reduced atmosphere and includes a multilayer film that is made of a lamination of a molybdenum layer and a silicon layer includes a laser irradiation unit for irradiating onto the mask a pulsed laser beam that has a wavelength of 200 nm or below.