Coordinate measuring machine for determining phase relationship of mask i.e. phase shift mask, during manufacture of semiconductor, has optical unit, where phase differences are determined based on optical unit together with detector

摘要

The machine (1) has an illuminating device and an imaging device that comprises a lens (9) and a detector (10), where the detector is a camera with a charge-coupled chip. The illuminating device has light sources (6, 14) provided in an incident light path and/or a light source provided in a transmitted light path. An optical unit (50) is arranged in a detection light path (5) that is defined by the lens. The phase differences between the light from a mask (2) are determined based on the optical unit together with the detector, where the phase differences are generated by the mask. An independent claim is also included for a method for determining phase relationship of a mask.