发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which is capable of improving the semiconductor device in reliability. <P>SOLUTION: The method of manufacturing a semiconductor device comprises processes of forming a conductive part 30 inside each recess provided on the first surface 20 of a semiconductor substrate 10 equipped with integrated circuits 12, partially removing the second surface 21 of the semiconductor substrate 10 to make the substrate 10 thin so as to enable the conductive parts 30 to penetrate through the substrate 10 from its first surface 20 to second surface 21, and cutting out the semiconductor substrate 10 into a plurality of pieces. The electrical properties of the semiconductor substrate are checked through the intermediary of the conductive parts in one of processes which are carried out after a conductive part forming process. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005051149(A) 申请公布日期 2005.02.24
申请号 JP20030283665 申请日期 2003.07.31
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI KOJI
分类号 H01L21/301;H01L21/304;H01L21/3205;H01L21/66;H01L21/78;H01L23/52;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L21/301
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