发明名称 MASKS, METHOD TO INSPECT AND ADJUST MASK POSITION, AND METHOD TO PATTERN PIXELS OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE UTILIZING THE MASKS
摘要 A method for pixel patterning and pixel position inspection of an organic light-emitting display device includes: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.
申请公布号 US2016343944(A1) 申请公布日期 2016.11.24
申请号 US201514883989 申请日期 2015.10.15
申请人 Samsung Display Co., Ltd. 发明人 LEE Sangshin;HA Dongjin;KANG Mingoo;KWON Ohseob;YI Sangmin
分类号 H01L51/00;H01L27/32;H01L51/56 主分类号 H01L51/00
代理机构 代理人
主权项 1. A method for pixel patterning and pixel position inspection of an organic light-emitting display device, the method comprising: forming, on a substrate using a first mask, a thin film layer of a first color corresponding to a first pixel pattern and a first pixel positioning pattern for inspecting a position of a first pixel; shifting, by a determined pitch, the first mask from a position associated with forming the thin film layer of the first color; aligning the shifted first mask with respect to the substrate; and forming, on the substrate using the shifted first mask, a thin film layer of a second color corresponding to the first pixel pattern and another first pixel positioning pattern for inspecting a position of a second pixel.
地址 Yongin-si KR