| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer useful as a constituent resin of a resist or the like, its manufacturing method, a resist composition which exhibits high sensitivity and high resolution, hardly forms a microgel and gives reduced line edge roughness when used for DUV excimer laser lithography or the like, and a pattern-forming method using the resist composition. <P>SOLUTION: The (co)polymer comprises a constituent unit represented by formula (1). A resist pattern is formed using the resist composition comprising the resist polymer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
