PROCESS FOR PRODUCING MOLYBDENUM-BASED SPUTTERING TARGET PLATE

摘要

[PROBLEMS] To provide a process for efficiently producing a molybdenum-based target plate having a large area in a high yield by combining a requirement concerning the content of a trace element with conditions for rolling to thereby reduce deformation resistance and inhibit the occurrence of cracks such as edge cracks. [MEANS FOR SOLVING PROBLEMS] The process, which is for producing a molybdenum-based sputtering target plate by rolling a molybdenum-based ingot, is characterized by comprising a step in which a molybdenum-based ingot is produced while regulating the oxygen concentration therein to 10 to 1,000 mass ppm and a step in which the molybdenum-based ingot is heated and rolled at a rolling temperature of 600-950°C.