发明名称 THIN-FILM DEVICE, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS
摘要 <p>PURPOSE: A thin film device, and a manufacturing method thereof, and an electronic device are provided to improve reliability by preventing foreign materials from being mixed with the thin film device. CONSTITUTION: A separating layer(11) is formed on one side of a substrate(10). The substrate is composed of a quartz glass and a soda glass. A support layer(12) used as a support of the thin film device is formed on the separating layer. The support layer is made of the clay as a main component. A protective layer(13) is formed on the substrate to cover the support layer. The protective layer is composed of the inorganic film such as a silicon oxynitride film and an oxide aluminum film. A thin film circuit(14) is formed on the support layer and the protective layer. An electrophoresis sheet(16) is formed on the thin film circuit.</p>
申请公布号 KR20100009496(A) 申请公布日期 2010.01.27
申请号 KR20090064803 申请日期 2009.07.16
申请人 SEIKO EPSON CORPORATION 发明人 ONODERA KATSUYOSHI
分类号 H01L29/786 主分类号 H01L29/786
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