发明名称 DEFECT OBSERVATION DEVICE AND DEFECT OBSERVATION METHOD
摘要 In a scheme for analyzing low magnification defect images and determining whether or not a defect detection method using cell comparison is applicable, if a defect detection method using cell comparison cannot be applied and the proportion transitioning to a defect detection method using die comparison increases, throughput may decrease even more than starting out with defect detection by a defect detection method using die comparison. The purpose of present invention is to carry out high precision defect detection with a stable throughput. In the present invention, the defect detection processing mode applied for detecting defects from the defect image is determined using a reference image, and defects are detected from the defect image by the defect detection processing mode that has been determined.
申请公布号 WO2016092640(A1) 申请公布日期 2016.06.16
申请号 WO2014JP82609 申请日期 2014.12.10
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 HIRAI TAKEHIRO;NAKAYAMA HIDEKI;NISHIGATA KENICHI
分类号 H01L21/66;G01N21/956 主分类号 H01L21/66
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