Device for vertical galvanic metal, preferably copper, deposition on a substrate and a container suitable for receiving such a device

摘要

The present invention is related to a device for vertical galvanic metal, preferably copper, deposition on a substrate, a container suitable for receiving such a device and a substrate holder, which is suitable for receiving a substrate to be treated, and the use of such a device inside of such a container for electroplating. The device comprises a detachable anode having at least a though going conduit connected to a carrier elemet, a fastening means and an electrical connecting element, said fastening means and said electrical connecting element being arranged on the backside of the carrier element.