| 发明名称 |
SYSTEM AND METHOD FOR MONITORING WAFER HANDLING AND A WAFER HANDLING MACHINE |
| 摘要 |
Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor and includes control logic. The control logic is configured to store a reference output of the sensor when the wafer handling machine is aligned and is configured to generate an indication signal when a difference between the reference output and a current output of the sensor exceeds a threshold. |
| 申请公布号 |
US2016336206(A1) |
申请公布日期 |
2016.11.17 |
| 申请号 |
US201615223882 |
申请日期 |
2016.07.29 |
| 申请人 |
GLOBALFOUNDRIES, Inc. |
发明人 |
Miner Stephen B.;Fosnight William John;Gallagher Ryan J. |
| 分类号 |
H01L21/67;H01L21/687;H01L21/673;G05B19/418 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system for monitoring wafer handling, the system comprising:
a sensor capable of being secured to a wafer handling machine; and a controller in electronic communication with the sensor and including control logic to:
store a reference output of the sensor when the wafer handling machine is aligned; andgenerate an indication signal when a difference between the reference output and a current output of the sensor during a wafer handling cycle exceeds a threshold,wherein the control logic is configured to store the reference output and generate the indication signal independent of signals from an automation control module of the wafer handling machine. |
| 地址 |
Grand Cayman KY |
