| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that imparts excellent solubility and contrast to a resist coating film on exposure to UV light at a wavelength of 193 nm or less. <P>SOLUTION: The resist composition comprises (a) an acid-dissociative functional group-containing polymer having a structural unit derived from a functional group-containing norbornanyl acrylate shown by formula (1) and (b) a photoacid generating agent. <P>COPYRIGHT: (C)2007,JPO&INPIT |
